Invention Grant
- Patent Title: Magnetoresistance effect element and magnetic memory
- Patent Title (中): 磁阻效应元件和磁存储器
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Application No.: US13701846Application Date: 2011-05-31
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Publication No.: US08917541B2Publication Date: 2014-12-23
- Inventor: Hideo Ohno , Shoji Ikeda , Fumihiro Matsukura , Masaki Endoh , Shun Kanai , Hiroyuki Yamamoto , Katsuya Miura
- Applicant: Hideo Ohno , Shoji Ikeda , Fumihiro Matsukura , Masaki Endoh , Shun Kanai , Hiroyuki Yamamoto , Katsuya Miura
- Applicant Address: JP Tokyo JP Miyagi
- Assignee: Hitachi, Ltd.,Tohoku University
- Current Assignee: Hitachi, Ltd.,Tohoku University
- Current Assignee Address: JP Tokyo JP Miyagi
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2010-129086 20100604
- International Application: PCT/JP2011/062493 WO 20110531
- International Announcement: WO2011/152400 WO 20111208
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C11/16 ; H01L43/08 ; H01L43/12 ; H01L43/02 ; G11B5/31 ; H01L27/22

Abstract:
Provided are a magneto resistive effect element with a stable magnetization direction perpendicular to a film plane and with a controlled magnetoresistance ratio, and a magnetic memory using the magneto resistive effect element. Ferromagnetic layers 106 and 107 of the magneto resistive effect element are formed from a ferromagnetic material containing at least one type of 3d transition metal such that the magnetoresistance ratio is controlled, and the film thickness of the ferromagnetic layers is controlled on an atomic layer level such that the magnetization direction is changed from a direction in the film plane to a direction perpendicular to the film plane.
Public/Granted literature
- US20130094284A1 MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY Public/Granted day:2013-04-18
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