Invention Grant
- Patent Title: Immersion exposure apparatus and device fabricating method with two substrate stages and metrology station
- Patent Title (中): 浸渍曝光装置和装置制造方法，具有两个基板台和测量台
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Application No.: US12007348Application Date: 2008-01-09
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Publication No.: US08922754B2Publication Date: 2014-12-30
- Inventor: Tomoharu Fujiwara , Yuichi Shibazaki
- Applicant: Tomoharu Fujiwara , Yuichi Shibazaki
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2004-318017 20041101
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20
Abstract:
The present invention provides an exposure apparatus can suppress the occurrence of residual liquid. An exposure apparatus comprises: a first stage that holds the substrate and is movable; a second stage that is movable independently of the first stage; and a liquid immersion mechanism that forms a liquid immersion region of a liquid on an upper surface of at least one stage of the first stage and the second stage; wherein, a recovery port that is capable of recovering the liquid is provided to the upper surface of the second stage.
Public/Granted literature
- US20080117393A1 Exposure apparatus and device fabricating method Public/Granted day:2008-05-22
Information query
