A treatment system for achieving a substantially uniform surface profile of a surface to be treated. The treatment system comprises a support panel which supports a rotatable orb, and the rotatable orb has an access aperture extending therethrough which facilitates receiving a desired surface treatment equipment. The access aperture is sized so as to permit the desired surface treatment equipment to pass therethrough and move relative thereto the access aperture, during surface treatment. The treatment system comprises a monitoring system for monitoring at least one of a spacing of a remote end of the surface treatment equipment from the surface to be treated and a treatment angle of the surface treatment equipment in order to control the surface treatment of the surface to be treated and achieve a substantially uniform surface profile, of the surface to be treated, following treatment.