Invention Grant
US08926788B2 Closed chamber for wafer wet processing 有权
用于晶圆湿法处理的封闭室

Closed chamber for wafer wet processing
Abstract:
An improved design for a closed chamber process module for single wafer wet processing utilizes a combination lid and gas showerhead for sealing the chamber from above. One or more media arms dispense liquid onto a wafer in the chamber. The media arms are mounted inside the chamber but are connected by a linkage that passes through the chamber wall to a drive unit mounted outside the chamber.
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