Invention Grant
- Patent Title: Closed chamber for wafer wet processing
- Patent Title (中): 用于晶圆湿法处理的封闭室
-
Application No.: US12913405Application Date: 2010-10-27
-
Publication No.: US08926788B2Publication Date: 2015-01-06
- Inventor: Karl-Heinz Hohenwarter
- Applicant: Karl-Heinz Hohenwarter
- Applicant Address: AT Villach
- Assignee: Lam Research AG
- Current Assignee: Lam Research AG
- Current Assignee Address: AT Villach
- Agency: Young & Thompson
- Main IPC: H01L21/465
- IPC: H01L21/465 ; H01L21/67

Abstract:
An improved design for a closed chamber process module for single wafer wet processing utilizes a combination lid and gas showerhead for sealing the chamber from above. One or more media arms dispense liquid onto a wafer in the chamber. The media arms are mounted inside the chamber but are connected by a linkage that passes through the chamber wall to a drive unit mounted outside the chamber.
Public/Granted literature
- US20120103522A1 CLOSED CHAMBER FOR WAFER WET PROCESSING Public/Granted day:2012-05-03
Information query
IPC分类: