Invention Grant
- Patent Title: Exhaust gas processing device
- Patent Title (中): 废气处理装置
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Application No.: US13282527Application Date: 2011-10-27
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Publication No.: US08926912B2Publication Date: 2015-01-06
- Inventor: Fumiyuki Mutsuda , Yoshitaka Fujita
- Applicant: Fumiyuki Mutsuda , Yoshitaka Fujita
- Applicant Address: JP Ogaki-shi
- Assignee: Ibiden Co., Ltd.
- Current Assignee: Ibiden Co., Ltd.
- Current Assignee Address: JP Ogaki-shi
- Agency: Mori & Ward, LLP
- Priority: WOPCT/JP2011/050094 20110106
- Main IPC: B01D50/00
- IPC: B01D50/00

Abstract:
An exhaust gas processing device includes a honeycomb structure in a pillar shape including a honeycomb unit, a catalytic agent, an inorganic mat member, a cylindrical metallic member and an insulating layer. The honeycomb unit includes cell walls to define a plurality of cells which extend from a first end of the honeycomb unit to a second end of the honeycomb unit along a longitudinal direction. The catalytic agent is provided on the cell walls. The inorganic mat member is wound around an outer peripheral surface of the honeycomb structure. The cylindrical metallic member accommodates the honeycomb structure around which the inorganic mat member is wound. The insulating layer has a thickness of about 20 μm to about 400 μm and is densely formed. The insulating layer is provided between an inner surface of the cylindrical metallic member and the inorganic mat member.
Public/Granted literature
- US20120177540A1 EXHAUST GAS PROCESSING DEVICE Public/Granted day:2012-07-12
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