Invention Grant
- Patent Title: Conductive substrate and process for producing same
- Patent Title (中): 导电基材及其制造方法
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Application No.: US13503632Application Date: 2010-11-18
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Publication No.: US08927054B2Publication Date: 2015-01-06
- Inventor: Manabu Yoshida , Toshihide Kamata
- Applicant: Manabu Yoshida , Toshihide Kamata
- Applicant Address: JP Tokyo
- Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee Address: JP Tokyo
- Agency: Law Office of Katsuhiro Arai
- Priority: JP2009-266075 20091124
- International Application: PCT/JP2010/070533 WO 20101118
- International Announcement: WO2011/065271 WO 20110603
- Main IPC: H05K1/03
- IPC: H05K1/03 ; H05K3/00 ; H05K3/12

Abstract:
Provided are a conductive substrate which can be produced from inexpensive materials at a lower temperature than those for conventional substrates, and a process for producing the conductive substrate. The conductive substrate comprises a substrate (1) and a conductive pattern (5) provided on the substrate (1), wherein the conductive pattern (5), except on a surface and in a vicinity thereof on a side opposite to the substrate side, entirely has a structure comprising a binder (2) and fine aluminum grains (3) dispersed therein, and on the surface and in the vicinity a surface metal aluminum layer (4) is formed in which the fine aluminum grains (3) are spread with a roller to form a conductive junction connecting the fine aluminum grains to each other.
Public/Granted literature
- US20120222890A1 CONDUCTIVE SUBSTRATE AND PROCESS FOR PRODUCING SAME Public/Granted day:2012-09-06
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