Invention Grant
- Patent Title: Method and apparatus for gas delivery
- Patent Title (中): 气体输送方法和装置
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Application No.: US13097831Application Date: 2011-04-29
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Publication No.: US08927066B2Publication Date: 2015-01-06
- Inventor: Zhiyuan Ye , Yihwan Kim
- Applicant: Zhiyuan Ye , Yihwan Kim
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: C23C16/448
- IPC: C23C16/448 ; C23C16/455

Abstract:
Methods and apparatus for gas delivery are disclosed herein. In some embodiments, a gas delivery system includes an ampoule for storing a precursor in solid or liquid form, a first conduit coupled to the ampoule and having a first end coupled to a first gas source to draw a vapor of the precursor from the ampoule into the first conduit, a second conduit coupled to the first conduit at a first junction located downstream of the ampoule and having a first end coupled to a second gas source and a second end coupled to a process chamber, and a heat source configured to heat the ampoule and at least a first portion of the first conduit from the ampoule to the second conduit and to heat only a second portion of the second conduit, wherein the second portion of the second conduit includes the first junction.
Public/Granted literature
- US20120273052A1 METHOD AND APPARATUS FOR GAS DELIVERY Public/Granted day:2012-11-01
Information query
IPC分类: