Invention Grant
- Patent Title: Method for producing thin oxidized carbon film, element having thin oxidized carbon film, and method for producing same
- Patent Title (中): 薄氧化碳膜的制造方法,具有薄氧化碳膜的元件及其制造方法
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Application No.: US14156293Application Date: 2014-01-15
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Publication No.: US08927095B2Publication Date: 2015-01-06
- Inventor: Akihiro Odagawa , Nozomu Matsukawa
- Applicant: Panasonic Corporation
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2011-159659 20110721
- Main IPC: B32B3/00
- IPC: B32B3/00 ; H01B3/00 ; C01B31/04 ; C01B31/02 ; H01L29/786 ; H01L29/161 ; H01L29/66 ; H01B13/18

Abstract:
A method for producing a thin oxidized carbon film according to the present disclosure includes: a first step of preparing a thin carbon film and a copper oxide being in contact with the thin carbon film and containing a mixture of Cu2O and CuO; and a second step of applying a voltage or a current between the thin carbon film and the copper oxide, with an electrical potential of the thin carbon film being positive relative to that of the copper oxide, and thereby oxidizing and converting a contact area of the thin carbon film with the copper oxide into an oxidized portion composed of oxidized carbon so as to form a thin oxidized carbon film having the oxidized portion.
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