Invention Grant
- Patent Title: Photoresist comprising nitrogen-containing compound
- Patent Title (中): 包含含氮化合物的光致抗蚀剂
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Application No.: US13013780Application Date: 2011-01-25
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Publication No.: US08927190B2Publication Date: 2015-01-06
- Inventor: Cong Liu , Chunyi Wu , Gerhard Pohlers , Gregory P. Prokopowicz , Cheng-Bai Xu
- Applicant: Cong Liu , Chunyi Wu , Gerhard Pohlers , Gregory P. Prokopowicz , Cheng-Bai Xu
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Edwards Wildman Palmer LLP
- Agent Peter F. Corless
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/26 ; C07C261/00
Abstract:
New nitrogen-containing compounds are provided that comprise multiple hydroxyl moieties and photoresist compositions that comprise such nitrogen-containing compounds. Preferred nitrogen-containing compounds comprise 1) multiple hydroxyl substituents (i.e. 2 or more) and 2) one or more photoacid-labile groups.
Public/Granted literature
- US20110223535A1 PHOTORESIST COMPRISING NITROGEN-CONTAINING COMPOUND Public/Granted day:2011-09-15
Information query
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