Invention Grant
- Patent Title: Antireflection structures with an exceptional low refractive index and devices containing the same
- Patent Title (中): 具有优异的低折射率的抗反射结构和含有它的装置
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Application No.: US13961017Application Date: 2013-08-07
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Publication No.: US08927437B2Publication Date: 2015-01-06
- Inventor: Rong-Ming Ho , Han-Yu Hsueh , Ming-Shiuan She , Hung-Ying Chen , Shangjr Gwo
- Applicant: National Tsing Hua University
- Applicant Address: TW Hsinchu
- Assignee: National Tsing Hua University
- Current Assignee: National Tsing Hua University
- Current Assignee Address: TW Hsinchu
- Agency: Bacon & Thomas, PLLC
- Priority: TW98122686A 20090703
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C09D5/00 ; B82Y30/00 ; B82Y40/00 ; G02B1/11 ; G02B1/12 ; B05D1/32 ; B05D5/02

Abstract:
Nanoporous polymers with gyroid nanochannels can be fabricated from the self-assembly of degradable block copolymer, polystyrene-b-poly(L-lactide) (PS-PLLA), followed by the hydrolysis of PLLA blocks. A well-defined nanohybrid material with SiO2 gyroid nanostructure in a PS matrix can be obtained using the nanoporous PS as a template for the sol-gel reaction. After subsequent UV degradation of the PS matrix, a highly porous inorganic gyroid network remains, yielding a single-component material with an exceptionally low refractive index (as low as 1.1).
Public/Granted literature
- US20140004709A1 ANTIREFLECTION STRUCTURES WITH AN EXCEPTIONAL LOW REFRACTIVE INDEX AND DEVICES CONTAINING THE SAME Public/Granted day:2014-01-02
Information query
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