Invention Grant
- Patent Title: Multiple gate semiconductor devices and their applications
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Application No.: US13832619Application Date: 2013-03-15
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Publication No.: US08928382B1Publication Date: 2015-01-06
- Inventor: Chun Lee Ler , Shuxian Chen , Jeffrey T. Watt
- Applicant: Altera Corporation
- Applicant Address: US CA San Jose
- Assignee: Altera Corporation
- Current Assignee: Altera Corporation
- Current Assignee Address: US CA San Jose
- Agency: Ward & Zinna, LLC
- Main IPC: H03H11/16
- IPC: H03H11/16 ; H01L29/78 ; G05F3/02 ; H03H11/20

Abstract:
A multiple gate semiconductor structure is disclosed having a thin segment of semiconductor with first and second major surfaces that are opposite one another, a first gate on the first major surface of the segment, a second gate on the second major surface of the segment opposite the first gate, a first differential input coupled to the first gate, and a second differential input coupled to the second gate. Preferably the semiconductor structure is symmetrical about a plane that extends through the thin segment between the first and second major surfaces. When a first voltage of a first polarity is applied to the first input and a second voltage of the same magnitude as that of the first voltage but of opposite polarity is applied to the second input, a virtual ground is established in the structure near its center of the segment.
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