Systems and methods for reducing process sensitivity in integrated circuit (“IC”) fabrication. An integrated circuit structure is provided that includes a first integrated circuit device having at least one parameter influenced by process variation in a first manner. The integrated circuit structure further includes a second integrated device having the least one parameter influenced by the process variation in a second manner. The first manner is opposite of the second manner. The second integrated device is configured to offset or reduce the influence of the process variation on the at least one parameter in the first integrated circuit device.