Invention Grant
- Patent Title: Lithographic apparatus and method of operating the apparatus
- Patent Title (中): 平版印刷设备及其操作方法
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Application No.: US12770356Application Date: 2010-04-29
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Publication No.: US08928857B2Publication Date: 2015-01-06
- Inventor: Ivo Adam Johannes Thomas , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
- Applicant: Ivo Adam Johannes Thomas , Siebe Landheer , Arnout Johannes Meester , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03F7/20
Abstract:
A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
Public/Granted literature
- US20100296067A1 LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING THE APPARATUS Public/Granted day:2010-11-25
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