Invention Grant
- Patent Title: Reflective mask
- Patent Title (中): 反光面膜
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Application No.: US13597721Application Date: 2012-08-29
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Publication No.: US08928871B2Publication Date: 2015-01-06
- Inventor: Masaru Suzuki , Nobuhiro Komine
- Applicant: Masaru Suzuki , Nobuhiro Komine
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-030811 20120215
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G02B5/08 ; G01J1/04 ; G03F7/20

Abstract:
According to a flare measuring method in an embodiment, a reflective mask, in which one reflective coordinate in a slit direction in a mask surface is determined when one scanning coordinate is determined, is placed on a scanner that includes a reflective projection optical system. Moreover, a light intensity of the exposure light is measured by performing a scanning exposure on an illuminance sensor moved to a predetermined position in the slit direction in a slit imaging plane. Then, an amount of flare at an intra-slit position corresponding to a position of the illuminance sensor in the slit direction is calculated by using a light intensity of exposure light received from an intra-slit position that does not correspond to the position of the illuminance sensor in the slit direction in the exposure light.
Public/Granted literature
- US20130208252A1 FLARE MEASURING METHOD, REFLECTIVE MASK, AND EXPOSURE APPARATUS Public/Granted day:2013-08-15
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