Invention Grant
US08928882B2 Measurement apparatus, exposure apparatus, and device fabrication method 有权
测量装置,曝光装置和装置制造方法

Measurement apparatus, exposure apparatus, and device fabrication method
Abstract:
The present invention provides a measurement apparatus which measures a position of a second object relative to a first object, the apparatus including a first measurement unit which includes a diffraction grating provided on the first object, and a first head and a second head provided on the second object, and is configured to measure the position of the second object relative to the first object by the first head or the second head, and a processing unit configured to perform a process of obtaining the position of the second object relative to the first object.
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