Invention Grant
- Patent Title: Measurement apparatus, exposure apparatus, and device fabrication method
- Patent Title (中): 测量装置,曝光装置和装置制造方法
-
Application No.: US13428001Application Date: 2012-03-23
-
Publication No.: US08928882B2Publication Date: 2015-01-06
- Inventor: Nobuo Imaoka
- Applicant: Nobuo Imaoka
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2011-084076 20110405; JP2012-048613 20120305
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01B11/14 ; G03F9/00

Abstract:
The present invention provides a measurement apparatus which measures a position of a second object relative to a first object, the apparatus including a first measurement unit which includes a diffraction grating provided on the first object, and a first head and a second head provided on the second object, and is configured to measure the position of the second object relative to the first object by the first head or the second head, and a processing unit configured to perform a process of obtaining the position of the second object relative to the first object.
Public/Granted literature
- US20120258391A1 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD Public/Granted day:2012-10-11
Information query