Invention Grant
- Patent Title: 193NM laser and inspection system
- Patent Title (中): 193NM激光和检测系统
-
Application No.: US14158615Application Date: 2014-01-17
-
Publication No.: US08929406B2Publication Date: 2015-01-06
- Inventor: Yung-Ho Chuang , J. Joseph Armstrong , Vladimir Dribinski , Yujun Deng , John Fielden
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Bever, Hoffman & Harms, LLP
- Main IPC: H01S3/30
- IPC: H01S3/30 ; H01S3/00 ; G01N21/84

Abstract:
A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.
Public/Granted literature
- US20140204963A1 193NM Laser And Inspection System Public/Granted day:2014-07-24
Information query