Invention Grant
US08930174B2 Modeling technique for resistive random access memory (RRAM) cells
有权
电阻随机存取存储器(RRAM)单元的建模技术
- Patent Title: Modeling technique for resistive random access memory (RRAM) cells
- Patent Title (中): 电阻随机存取存储器(RRAM)单元的建模技术
-
Application No.: US13077941Application Date: 2011-03-31
-
Publication No.: US08930174B2Publication Date: 2015-01-06
- Inventor: Wei Lu
- Applicant: Wei Lu
- Applicant Address: US CA Santa Clara
- Assignee: Crossbar, Inc.
- Current Assignee: Crossbar, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Ogawa P.C.
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06G7/62 ; G11C13/00

Abstract:
Accurate simulation of two-terminal resistive random access memory (RRAM) behavior is accomplished by solving equations including state variables for filament length growth, filament width growth, and temperature. Such simulations are often run in a SPICE environment. Highly accurate models simulate the dynamic nature of filament propagation and multiple resistive states by using a sub-circuit to represent an RRAM cell. In the sub-circuit, voltages on floating nodes control current output while the voltage dropped across the sub-circuit controls growth and temperature characteristics. Properly executed, such a sub-circuit can accurately model filament growth at all phases of conductance including dynamic switching and a plurality of resistive states.
Public/Granted literature
- US20120166169A1 MODELING TECHNIQUE FOR RESISTIVE RANDOM ACCESS MEMORY (RRAM) CELLS Public/Granted day:2012-06-28
Information query