Invention Grant
- Patent Title: Near-infrared shielding coating agent curable at ordinary temperatures, near infrared shielding film using same, and manufacturing method therefor
- Patent Title (中): 常温下可固化的近红外屏蔽涂层剂,使用其的近红外屏蔽膜及其制造方法
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Application No.: US13376869Application Date: 2010-06-09
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Publication No.: US08932397B2Publication Date: 2015-01-13
- Inventor: Yoichi Ishibai , Akihito Sakai , Takashi Nishikawa , Kenji Kataoka , Kiyoyuki Hotta , Hideyo Ando , Yuzo Fukuda , Yorisuke Kondo , Kazuya Suzuki
- Applicant: Yoichi Ishibai , Akihito Sakai , Takashi Nishikawa , Kenji Kataoka , Kiyoyuki Hotta , Hideyo Ando , Yuzo Fukuda , Yorisuke Kondo , Kazuya Suzuki
- Applicant Address: JP Osaka
- Assignee: Ishihara Sangyo Kaisha. Ltd.
- Current Assignee: Ishihara Sangyo Kaisha. Ltd.
- Current Assignee Address: JP Osaka
- Agency: Manelli Selter PLLC
- Agent Paul E. White, Jr.
- Priority: JP2009-141348 20090612
- International Application: PCT/JP2010/059743 WO 20100609
- International Announcement: WO2010/143645 WO 20101216
- Main IPC: C09D5/32
- IPC: C09D5/32 ; C08K5/5435 ; C08K5/5455 ; C03C17/34 ; C09D7/12 ; C08K3/22 ; C08K5/5419

Abstract:
Provided is a near-infrared shielding coating agent containing: (1) an inorganic near-infrared absorbing agent; (2) a tetrafunctional silicon compound represented by general formula Si(OR1)4, a hydrolysate thereof, and/or a condensation polymerization product thereof; (3) a trifunctional silicon compound represented by general formula R2Si(OR3)3, a hydrolysate thereof, and/or a condensation polymerization product thereof; (4) a silane coupling agent represented by one of the general formulas Si(X)3—Y or R4Si(X)2—Y, a hydrolysate thereof, and/or a condensation polymerization product thereof; and (5) a solvent. This coating agent allows the formation, at an ordinary temperature between 5° C. and 40° C., of a near-infrared shielding film that has a high film hardness and is not prone to cracks.
Public/Granted literature
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