Invention Grant
- Patent Title: Non-stoichiometric NiOx ceramic target
- Patent Title (中): 非化学计量的NiOx陶瓷靶
-
Application No.: US10502052Application Date: 2003-02-04
-
Publication No.: US08932436B2Publication Date: 2015-01-13
- Inventor: Xavier Fanton , Jean-Christophe Giron
- Applicant: Xavier Fanton , Jean-Christophe Giron
- Applicant Address: FR Courbevoie
- Assignee: Saint-Gobain Glass France
- Current Assignee: Saint-Gobain Glass France
- Current Assignee Address: FR Courbevoie
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR0201528 20020206
- International Application: PCT/FR03/00340 WO 20030204
- International Announcement: WO03/066928 WO 20030814
- Main IPC: C23C14/34
- IPC: C23C14/34 ; G02F1/15 ; C04B35/01 ; C23C14/08 ; G02F1/01 ; C23C14/35
Abstract:
The subject of the invention is an essentially ceramic target for a sputtering device, especially for magnetically enhanced sputtering, said target comprising predominantly nickel oxide, the nickel oxide NiOx being oxygen-deficient with respect to the stoichiometric composition.
Public/Granted literature
- US20050115828A1 Non-stoichiometric niox ceramic target Public/Granted day:2005-06-02
Information query
IPC分类:
