Invention Grant
- Patent Title: Plating apparatus and plating method
- Patent Title (中): 电镀装置及电镀方法
-
Application No.: US13136826Application Date: 2011-08-11
-
Publication No.: US08932440B2Publication Date: 2015-01-13
- Inventor: Keiji Shinyama , Tomoya Uchida
- Applicant: Keiji Shinyama , Tomoya Uchida
- Applicant Address: JP Kariya
- Assignee: Denso Corporation
- Current Assignee: Denso Corporation
- Current Assignee Address: JP Kariya
- Agency: Harness, Dickey & Pierce, PLC
- Priority: JP2010-213944 20100924
- Main IPC: B23H11/00
- IPC: B23H11/00 ; C25B9/00 ; C25C7/00 ; C25D17/00 ; C25F7/00 ; C25D21/14 ; C25D21/18 ; C25D5/00

Abstract:
[Problem] To provide a plating method and apparatus which do not require preparation of a separate treatment tank for each treatment step and therefore enable the facility to be reduced in size and, further, which can reduce the amounts of use of the treatment solutions.[Solution] A plating apparatus feeding a plating solution to a treatment tank in which an electrode is arranged and plating a workpiece made of a metal so as to perform plating, the plating apparatus characterized by being provided with a plurality of pipes which are connected to an outer wall of the treatment tank and a switch valve which is provided able to rotate at an inner side of the outer wall and which has at least one feed port for making at least one treatment solution feed pipe selected from the plurality of treatment solution feed pipes communicate with the treatment tank.
Public/Granted literature
- US20120073979A1 Plating apparatus and plating method Public/Granted day:2012-03-29
Information query