Invention Grant
- Patent Title: Photosensitive polyimides
- Patent Title (中): 光敏聚酰亚胺
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Application No.: US12354905Application Date: 2009-01-16
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Publication No.: US08932801B2Publication Date: 2015-01-13
- Inventor: Meng-Yen Chou , Chuan Zong Lee
- Applicant: Meng-Yen Chou , Chuan Zong Lee
- Applicant Address: CN Taiwan
- Assignee: Eternal Chemical Co., Ltd.
- Current Assignee: Eternal Chemical Co., Ltd.
- Current Assignee Address: CN Taiwan
- Agency: Ladas & Parry LLP
- Priority: TW97101740A 20080116
- Main IPC: G03F7/038
- IPC: G03F7/038 ; C08F283/04 ; C08G18/60 ; C08G73/12 ; C08G73/10 ; C08L79/08 ; H05K3/28
Abstract:
The present invention relates to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemistry resistance, and flexibility, and can be used as a liquid photo resist or dry film resist, or used in a solder resist, coverlay film, or printed wiring board.
Public/Granted literature
- US20090181324A1 PHOTOSENSITIVE POLYIMIDES Public/Granted day:2009-07-16
Information query
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