Invention Grant
- Patent Title: Active matrix substrate, production method, and display device
- Patent Title (中): 有源矩阵基板，制作方法及显示装置
-
Application No.: US13512474Application Date: 2010-11-05
-
Publication No.: US08933452B2Publication Date: 2015-01-13
- Inventor: Hisao Ochi
- Applicant: Hisao Ochi
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Keating & Bennett, LLP
- Priority: JP2009-272288 20091130
- International Application: PCT/JP2010/069701 WO 20101105
- International Announcement: WO2011/065204 WO 20110603
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L29/49 ; H01L27/12 ; H01L29/45 ; G02F1/1362
Abstract:
Disclosed is an active matrix substrate (5) on which pixels, each having a thin film transistor (18) and a pixel electrode (19) connected to the thin film transistor (18), are disposed in a matrix, and that includes a base material (5a) on which the pixels in a matrix are formed. In a contact hole portion (H), by anodically oxidizing a three-layered metal film (metal film) (21), an anodic oxidation film (29) is formed on the three-layered metal film (21) so as to fill a contact hole of a protective layer (27), with an end portion of the anodic oxidation film (29) being placed under an insulating layer (28). In the contact hole portion (H), the pixel electrode (19) and the three-layered metal film (21) are connected to each other via the anodic oxidation film (29).
Public/Granted literature
- US20120235149A1 ACTIVE MATRIX SUBSTRATE, PRODUCTION METHOD, AND DISPLAY DEVICE Public/Granted day:2012-09-20
Information query
IPC分类:
