Invention Grant
- Patent Title: Semiconductor device having schottky diode structure
- Patent Title (中): 具有肖特基二极管结构的半导体器件
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Application No.: US13666393Application Date: 2012-11-01
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Publication No.: US08933531B2Publication Date: 2015-01-13
- Inventor: Woo Cul Jeon , Jung Hee Lee , Young Hwan Park , Ki Yeol Park
- Applicant: Samsung Electro-Mechanics Co., Ltd.
- Applicant Address: KR Suwon
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon
- Priority: KR10-2009-0080746 20090828; KR10-2009-0080747 20090828
- Main IPC: H01L27/14
- IPC: H01L27/14 ; H01L29/872 ; H01L29/40 ; H01L29/66 ; H01L29/20 ; H01L29/205 ; H01L29/47 ; H01L29/778

Abstract:
A semiconductor device including a base substrate; a semiconductor layer which is disposed on the base substrate and has a 2-Dimensional Electron Gas (2DEG) generated within the semiconductor layer; a plurality of first ohmic electrodes which are disposed on the central region of the semiconductor layer and have island-shaped cross sections; a second ohmic electrode which is disposed on edge regions of the semiconductor layer; and a Schottky electrode part has first bonding portions bonded to the first ohmic electrodes, and a second bonding portion bonded to the semiconductor layer. A depletion region is provided to be spaced apart from the 2DEG when the semiconductor device is driven at an on-voltage and is provided to be expanded to the 2DEG when the semiconductor device is driven at an off-voltage, the depletion region being generated within the semiconductor layer by bonding the semiconductor layer and the second bonding portion.
Public/Granted literature
- US20130056797A1 SEMICONDUCTOR DEVICE HAVING SCHOTTKY DIODE STRUCTURE Public/Granted day:2013-03-07
Information query
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