Invention Grant
- Patent Title: Liquid ejecting head and liquid ejecting apparatus
- Patent Title (中): 液体喷头和液体喷射装置
-
Application No.: US14141159Application Date: 2013-12-26
-
Publication No.: US08936355B2Publication Date: 2015-01-20
- Inventor: Kosuke Wakamatsu , Nobuhiro Naito , Satoshi Nagatoya , Michiya Nakamura , Takeshi Yasoshima
- Applicant: Seiko Epson Corporation
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2012-284504 20121227
- Main IPC: B41J2/045
- IPC: B41J2/045 ; B41J2/05 ; B41J2/14 ; B41J2/16

Abstract:
A liquid ejecting head suppresses erosion of silicon substrates by liquid, and whereby suppresses leakage of liquid, discharging failure of liquid droplets, and peeling-off of laminated substrates. The liquid ejecting head includes at least a nozzle plate on which nozzle openings for discharging liquid are provided, and a flow path formation substrate on which a pressure generation chamber communicating with the nozzle openings is provided. The nozzle plate is formed with a silicon substrate. At least the flow path formation substrate and the nozzle plate are bonded to each other after providing a tantalum oxide film formed by atomic layer deposition on the entire surfaces including a bonded surface.
Public/Granted literature
- US20140184705A1 LIQUID EJECTING HEAD AND LIQUID EJECTING APPARATUS Public/Granted day:2014-07-03
Information query
IPC分类: