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US08936951B2 Method of manufacturing semiconductor lasers 有权
制造半导体激光器的方法

Method of manufacturing semiconductor lasers
Abstract:
Provided are a semiconductor laser and a method of manufacturing the same. The method includes: providing a substrate including a buried oxide layer; forming patterns, which includes an opening part to expose the substrate, by etching the buried oxide layer; forming a germanium single crystal layer in the opening part; and forming an optical coupler, which is adjacent to the germanium single crystal layer, on the substrate.
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