Invention Grant
- Patent Title: Method of manufacturing semiconductor lasers
- Patent Title (中): 制造半导体激光器的方法
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Application No.: US13776428Application Date: 2013-02-25
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Publication No.: US08936951B2Publication Date: 2015-01-20
- Inventor: In Gyoo Kim , Gyungock Kim , Sang Hoon Kim , Ki Seok Jang , JiHo Joo
- Applicant: Electronics and Telecommunications Research Institute
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Priority: KR10-2012-0114259 20121015
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01S5/30 ; H01S5/026 ; H01S5/32 ; G02B6/12 ; H01S5/02 ; H01S5/042

Abstract:
Provided are a semiconductor laser and a method of manufacturing the same. The method includes: providing a substrate including a buried oxide layer; forming patterns, which includes an opening part to expose the substrate, by etching the buried oxide layer; forming a germanium single crystal layer in the opening part; and forming an optical coupler, which is adjacent to the germanium single crystal layer, on the substrate.
Public/Granted literature
- US20140105235A1 SEMICONDUCTOR LASER AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2014-04-17
Information query
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