Invention Grant
- Patent Title: Reflective optical element for EUV lithography
- Patent Title (中): 用于EUV光刻的反光光学元件
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Application No.: US13188678Application Date: 2011-07-22
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Publication No.: US08937709B2Publication Date: 2015-01-20
- Inventor: Joern Weber
- Applicant: Joern Weber
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Edell, Shapiro & Finnan, LLC
- Priority: DE102009054653 20091215
- Main IPC: G02B5/08
- IPC: G02B5/08 ; G02B1/10 ; G03F7/20 ; B82Y30/00

Abstract:
A stress-reduced reflective optical element for a working wavelength in the soft X-ray and extreme ultraviolet wavelength range includes a first multilayer system (4) of at least two alternating materials (41, 42) having different real parts of the refractive index at the working wavelength on a substrate (2), which exerts a layer stress on the substrate (2), and comprising a second multilayer system (6) of at least two alternating materials (61, 62) on a substrate (2), which exerts an opposed layer stress on the substrate (2) and is arranged between the first multilayer system (4) and the substrate (2), wherein a first (61) of the at least two materials of the second multilayer system (6) is interrupted by layers (62) having a thickness of up to 1 nm of the at least one further material of the second multilayer system (6) at such distances that the first material is present in an amorphous state.
Public/Granted literature
- US20120019797A1 REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY Public/Granted day:2012-01-26
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