Invention Grant
US08937770B2 Excimer laser apparatus projecting a beam with a selectively variable short-axis beam profile 有权
准分子激光装置用选择性可变的短轴光束轮廓投影光束

Excimer laser apparatus projecting a beam with a selectively variable short-axis beam profile
Abstract:
Apparatus for homogenizing and projecting two laser-beams is arranged such that the projected homogenized beams are aligned parallel to each other in a first transverse axis and partially overlap in second transverse axis perpendicular to the first transverse axis. The projected homogenized laser-beams have different intensities in the second axis and the degree of partial overlap is selected such that the combined intensity of the laser beams in the second axis has a step profile.
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