Invention Grant
- Patent Title: Semiconductor device having a through contact
- Patent Title (中): 具有通孔的半导体器件
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Application No.: US14249642Application Date: 2014-04-10
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Publication No.: US08941217B2Publication Date: 2015-01-27
- Inventor: Hermann Gruber , Thomas Gross , Andreas Peter Meiser , Markus Zundel
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L23/48

Abstract:
A semiconductor device includes a semiconductor substrate having a first side and a second side opposite the first side, an active area and a through contact area, the active area including a transistor structure having a control electrode, the through contact area including a semiconductor mesa having insulated sidewalls. The semiconductor device further includes a first metallization on the first side in the active area and a recess extending from the first side into the semiconductor substrate and between the active area and the through contact area and including in the through contact area a horizontally widening portion, the recess being at least partly filled with a conductive material forming a first conductive region in ohmic contact with the semiconductor mesa and the transistor structure. The semiconductor device also includes a control metallization on the second side and in ohmic contact with the semiconductor mesa.
Public/Granted literature
- US20140299972A1 SEMICONDUCTOR DEVICE HAVING A THROUGH CONTACT Public/Granted day:2014-10-09
Information query
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