Invention Grant
- Patent Title: ESD protection apparatus
- Patent Title (中): ESD保护装置
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Application No.: US13712367Application Date: 2012-12-12
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Publication No.: US08941959B2Publication Date: 2015-01-27
- Inventor: Yu-Ti Su , Shu-Ming Cheng
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H02H9/00
- IPC: H02H9/00 ; H02H9/04

Abstract:
An electrostatic discharge (ESD) protection structure comprises a first NPN transistor and a second NPN transistor connected in parallel. The bases of the first NPN transistor and the second NPN transistor are coupled together and further coupled to a first voltage potential and a second voltage potential through two deep trench capacitors respectively. The ESD protection structure further comprises a third deep trench capacitor and a fourth deep trench capacitor coupled between the first voltage potential and the second voltage potential.
Public/Granted literature
- US20140160606A1 ESD Protection Apparatus Public/Granted day:2014-06-12
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