Invention Grant
- Patent Title: Method for producing metal thin film
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Application No.: US13233581Application Date: 2011-09-15
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Publication No.: US08943963B2Publication Date: 2015-02-03
- Inventor: Masanobu Tanaka , Hirotsugu Ishihara , Toshiki Shimamura , Takahiro Kamei
- Applicant: Masanobu Tanaka , Hirotsugu Ishihara , Toshiki Shimamura , Takahiro Kamei
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Wolf, Greenfield & Sacks, P.C.
- Priority: JP2007-158341 20070615
- Main IPC: B41F1/00
- IPC: B41F1/00 ; B41F17/00

Abstract:
A method for producing a metal thin film on a substrate includes: a step of applying an ink to a flat blanket; a first transfer step of bringing the first blanket and a letterpress having a predetermined pattern of projections into contact by a pressure compression while the flat blanked and the letterpress being disposed opposite each other, to selectively transfer a portion of the ink on the flat blanket corresponding to the projections to the letterpress; a second transfer step of bringing the flat blanket obtained after the first transfer step and the substrate into contact by pressure compression while the flat blanket and the substrate being disposed opposite each other, to transfer the ink remaining on the flat blanket to the substrate; and a step of subjecting the substrate obtained after the second transfer step to electroless plating to deposit a metal thin film on the substrate.
Public/Granted literature
- US20120000382A1 METHOD FOR PRODUCING METAL THIN FILM Public/Granted day:2012-01-05
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