Invention Grant
US08945304B2 Ultrahigh vacuum process for the deposition of nanotubes and nanowires 有权
用于沉积纳米管和纳米线的超高真空工艺

Ultrahigh vacuum process for the deposition of nanotubes and nanowires
Abstract:
A system and method A method of growing an elongate nanoelement from a growth surface includes: a) cleaning a growth surface on a base element; b) providing an ultrahigh vacuum reaction environment over the cleaned growth surface; c) generating a reactive gas of an atomic material to be used in forming the nanoelement; d) projecting a stream of the reactive gas at the growth surface within the reactive environment while maintaining a vacuum of at most 1×10−4 Pascal; e) growing the elongate nanoelement from the growth surface within the environment while maintaining the pressure of step c); f) after a desired length of nanoelement is attained within the environment, stopping direction of reactive gas into the environment; and g) returning the environment to an ultrahigh vacuum condition.
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