Invention Grant
- Patent Title: Gas supply device
- Patent Title (中): 供气装置
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Application No.: US12857895Application Date: 2010-08-17
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Publication No.: US08945306B2Publication Date: 2015-02-03
- Inventor: Einosuke Tsuda
- Applicant: Einosuke Tsuda
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2008-039289 20080220
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/40

Abstract:
A gas supply device disposed opposite to a substrate mounted on a loading board in a processing container and supplying a process gas for processing the substrate comprises a top plate member having a recess formed to spread gradually toward the state in order to constitute a gas diffusion space at a position facing the substrate on the loading board, and a gas supply nozzle projecting into the recess from the top thereof and having a plurality of gas supply holes along the circumferential direction of the recess.
Public/Granted literature
- US20100310772A1 GAS SUPPLY DEVICE Public/Granted day:2010-12-09
Information query
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