Invention Grant
- Patent Title: Wiring substrate and semiconductor device
- Patent Title (中): 接线基板和半导体器件
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Application No.: US13926214Application Date: 2013-06-25
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Publication No.: US08945336B2Publication Date: 2015-02-03
- Inventor: Atsushi Nakamura , Mitsuyoshi Imai
- Applicant: Shinko Electric Industries Co., Ltd.
- Applicant Address: JP Nagano-shi, Nagano-ken
- Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee Address: JP Nagano-shi, Nagano-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2012-147389 20120629
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/495 ; H01L23/31

Abstract:
A wiring substrate includes an adhesive layer, a wiring layer, and a support substrate. The adhesive layer includes a first surface and a second surface that is opposite to the first surface. The wiring layer is formed on the first surface of the adhesive layer. The support substrate is formed on the second surface of the adhesive layer. The wiring layer is partially exposed in a through hole extending through the adhesive layer and the support substrate in a thicknesswise direction. The support substrate is adhered to the adhesive layer in a removable manner.
Public/Granted literature
- US20140001648A1 WIRING SUBSTRATE AND SEMICONDUCTOR DEVICE Public/Granted day:2014-01-02
Information query
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