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US08945794B2 Process for forming silver films on silicon 有权
在硅上形成银膜的工艺

Process for forming silver films on silicon
Abstract:
A process is provided for etching a silicon-containing substrate. In the process, the surface of the substrate is cleaned. A film of alumina is deposited on the cleaned substrate surface. A silver film is deposited above the film of alumina. An etchant comprising HF is contacted with the silver film.
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