Invention Grant
- Patent Title: Self-topcoating resist for photolithography
- Patent Title (中): 用于光刻的自表面涂层抗蚀剂
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Application No.: US11380731Application Date: 2006-04-28
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Publication No.: US08945808B2Publication Date: 2015-02-03
- Inventor: Robert Allen David , Phillip Joe Brock , Carl E Larson , Daniel Paul Sanders , Ratnam Sooriyakumaran , Linda Karin Sundberg , Hoa D Truong , Gregory Michael Wallraff
- Applicant: Robert Allen David , Phillip Joe Brock , Carl E Larson , Daniel Paul Sanders , Ratnam Sooriyakumaran , Linda Karin Sundberg , Hoa D Truong , Gregory Michael Wallraff
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Norris McLaughlin & Marcus, P.A.
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/09 ; G03F7/20 ; G03F7/30 ; G03F7/36
Abstract:
Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid generator, a solvent; and a self-topcoating resist additive. A method of forming a patterned material layer on a substrate using the resist composition is also disclosed.
Public/Granted literature
- US20070254235A1 SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY Public/Granted day:2007-11-01
Information query
IPC分类:
