Invention Grant
US08945809B2 Fluorinated monomer, fluorinated polymer, resist composition, and patterning process
有权
氟化单体，氟化聚合物，抗蚀剂组合物和图案化工艺
- Patent Title: Fluorinated monomer, fluorinated polymer, resist composition, and patterning process
- Patent Title (中): 氟化单体，氟化聚合物，抗蚀剂组合物和图案化工艺
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Application No.: US12952304Application Date: 2010-11-23
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Publication No.: US08945809B2Publication Date: 2015-02-03
- Inventor: Koji Hasegawa , Masayoshi Sagehashi , Taku Morisawa , Yuji Harada , Takao Yoshihara
- Applicant: Koji Hasegawa , Masayoshi Sagehashi , Taku Morisawa , Yuji Harada , Takao Yoshihara
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2009-290054 20091222
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; G03F7/039 ; C07C69/73 ; C08F220/22 ; C08F220/24 ; C08F220/26 ; C08F222/18 ; C08F222/22 ; C08L33/14 ; C08K5/36 ; C08L33/16
Abstract:
A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 is a monovalent hydrocarbon group which may have halogen or oxygen, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
Public/Granted literature
- US20110151381A1 FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Public/Granted day:2011-06-23
Information query
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