Invention Grant
- Patent Title: Acid generators and photoresists comprising same
- Patent Title (中): 含酸产生剂和含有它的光致抗蚀剂
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Application No.: US14027324Application Date: 2013-09-16
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Publication No.: US08945814B2Publication Date: 2015-02-03
- Inventor: James F. Cameron , Vipul Jain , Paul J. LaBeaume , Jin Wuk Sung , James W. Thackeray
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Edwards Wildman Palmer LLP
- Agent Peter F. Corless
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07D333/00 ; C07C315/00 ; C08F12/30
Abstract:
Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.
Public/Granted literature
- US20140080058A1 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME Public/Granted day:2014-03-20
Information query
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