Invention Grant
- Patent Title: Method of manufacturing liquid ejection head
- Patent Title (中): 液体喷射头的制造方法
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Application No.: US14266483Application Date: 2014-04-30
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Publication No.: US08945818B2Publication Date: 2015-02-03
- Inventor: Kazunari Ishizuka
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc. IP Division
- Priority: JP2013-096855 20130502
- Main IPC: B41J2/16
- IPC: B41J2/16

Abstract:
A method of manufacturing a liquid ejection head, and the method includes a process of providing a first photosensitive resin layer containing a photodegradable positive photosensitive resin and serving as a mold material of the channel on a substrate, a process of providing a gas barrier layer having a film density of 1 g/cm3 or more on the first photosensitive resin layer, a process of subjecting the first photosensitive resin layer and the gas barrier layer to pattern exposure, and then performing development to thereby form the mold material of a channel and also removing the gas barrier layer before or simultaneously with the development, a process of providing a second photosensitive resin layer on the mold material and the substrate, a process of subjecting the second photosensitive resin layer to pattern exposure, and then performing development, and a process of removing the mold material of the channel.
Public/Granted literature
- US20140329181A1 METHOD OF MANUFUCTURING LIQUID EJECTION HEAD Public/Granted day:2014-11-06
Information query
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