Invention Grant
US08945955B2 Method of changing reflectance or resistance of a region in an optoelectronic memory device
有权
改变光电存储器件中的区域的反射率或电阻的方法
- Patent Title: Method of changing reflectance or resistance of a region in an optoelectronic memory device
- Patent Title (中): 改变光电存储器件中的区域的反射率或电阻的方法
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Application No.: US13765772Application Date: 2013-02-13
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Publication No.: US08945955B2Publication Date: 2015-02-03
- Inventor: Fen Chen , Richard Steven Kontra , Tom C. Lee , Theodore M. Levin , Christopher David Muzzy , Timothy Dooling Sullivan
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts, LLP
- Agent Michael LeStrange
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/66 ; G11C13/00 ; G11C13/04 ; H01L45/00

Abstract:
A method for changing reflectance or resistance of a region in an optoelectronic memory device. Changing the reflectance of the region includes sending an electric current through the region to cause a reflectance change in the region. Changing the resistance of the region includes: projecting a laser beam at a first beam intensity on the region, resulting in the region changing from a first to a second different resistance value; electrically reading the second resistance value during which an optical signal carried by the laser beam has a first digital value; after electrically reading the second resistance value, the laser beam is projected at a second beam intensity on the region resulting in the region changing from the second to the first resistance value; and electrically reading the first resistance value of the region while the laser beam is being projected on the region at the second beam intensity.
Public/Granted literature
- US20130258765A1 METHOD OF CHANGING REFLECTANCE OR RESISTANCE OF A REGION IN AN OPTOELECTRONIC MEMORY DEVICE Public/Granted day:2013-10-03
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