Invention Grant
- Patent Title: Method of manufacturing liquid ejection head
- Patent Title (中): 液体喷射头的制造方法
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Application No.: US13863569Application Date: 2013-04-16
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Publication No.: US08945957B2Publication Date: 2015-02-03
- Inventor: Hiroto Komiyama , Satoshi Ibe , Jun Yamamuro , Kouji Hasegawa , Shiro Sujaku , Yoshinori Tagawa
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2012-103159 20120427
- Main IPC: H01L49/00
- IPC: H01L49/00 ; B41J2/16

Abstract:
The method of manufacturing a liquid ejection head includes: forming a first protective layer on one surface of the substrate; forming the wiring layer on another surface of the substrate; forming the insulating layer on the wiring layer, and then partially removing the insulating layer to partially expose the wiring layer; forming the electrode pad on an exposed portion of the wiring layer; forming a flow path member on the another surface of the substrate; forming a second protective layer on the one surface of the substrate after the formation of the flow path member; and partially removing at least one of the first protective layer and the second protective layer, and then forming the supply port leading from the one surface of the substrate to the another surface of the substrate.
Public/Granted literature
- US20130288405A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD Public/Granted day:2013-10-31
Information query
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