Invention Grant
US08945965B2 Method for producing a group III nitride semiconductor light-emitting device
有权
III族氮化物半导体发光元件的制造方法
- Patent Title: Method for producing a group III nitride semiconductor light-emitting device
- Patent Title (中): III族氮化物半导体发光元件的制造方法
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Application No.: US13525110Application Date: 2012-06-15
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Publication No.: US08945965B2Publication Date: 2015-02-03
- Inventor: Naoyuki Nakada , Yasuhisa Ushida
- Applicant: Naoyuki Nakada , Yasuhisa Ushida
- Applicant Address: JP Kiyosu-Shi, Aichi-Ken
- Assignee: Toyoda Gosei Co., Ltd.
- Current Assignee: Toyoda Gosei Co., Ltd.
- Current Assignee Address: JP Kiyosu-Shi, Aichi-Ken
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2011-136197 20110620
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L33/00 ; H01L33/14

Abstract:
The present invention provides a Group III nitride semiconductor light-emitting device exhibiting improved light extraction performance. In the production method, a p cladding layer of p-AlGaN is formed by the MOCVD method on a light-emitting layer at a pressure of 30 kPa and with an Mg concentration of 1.5×1020/cm3. A plurality of regions with a nitrogen polarity is formed in the crystals with a Group III element polarity, and thus the p cladding layer has a hexagonal columnar concave and convex configuration on the surface thereof. Subsequently, a p contact layer of GaN is formed by the MOCVD method, in a film along the concave and convex configuration on the p cladding layer.
Public/Granted literature
- US20120322189A1 METHOD FOR PRODUCING A GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE Public/Granted day:2012-12-20
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