Invention Grant
- Patent Title: Thin-film transistor, array substrate having the thin-film transistor and method of manufacturing the array substrate
- Patent Title (中): 薄膜晶体管,具有薄膜晶体管的阵列基板和制造阵列基板的方法
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Application No.: US13030213Application Date: 2011-02-18
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Publication No.: US08946005B2Publication Date: 2015-02-03
- Inventor: Je-Hun Lee , Do-Hyun Kim , Eun-Guk Lee , Chang-Oh Jeong
- Applicant: Je-Hun Lee , Do-Hyun Kim , Eun-Guk Lee , Chang-Oh Jeong
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR2007-58353 20070614
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/84 ; H01L29/786 ; H01L27/12

Abstract:
A thin-film transistor includes a semiconductor pattern, source and drain electrodes and a gate electrode, the semiconductor pattern is formed on a base substrate, and the semiconductor pattern includes metal oxide. The source and drain electrodes are formed on the semiconductor pattern such that the source and drain electrodes are spaced apart from each other and an outline of the source and drain electrodes is substantially same as an outline of the semiconductor pattern. The gate electrode is disposed in a region between the source and drain electrodes such that portions of the gate electrode are overlapped with the source and drain electrodes. Therefore, leakage current induced by light is minimized. As a result, characteristics of the thin-film transistor are enhanced, after-image is reduced to enhance display quality, and stability of manufacturing process is enhanced.
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