Invention Grant
- Patent Title: Manufacturing method of thin film and metal line for display using the same, thin film transistor array panel, and method for manufacturing the same
- Patent Title (中): 用于使用该显示器的薄膜和金属线的制造方法，薄膜晶体管阵列面板及其制造方法
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Application No.: US12931516Application Date: 2011-02-03
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Publication No.: US08946025B2Publication Date: 2015-02-03
- Inventor: Byeong-Beom Kim , Je-Hyeong Park , Jae-Hyoung Youn , Jean-Ho Song , Jong-In Kim
- Applicant: Byeong-Beom Kim , Je-Hyeong Park , Jae-Hyoung Youn , Jean-Ho Song , Jong-In Kim
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2010-0010156 20100203
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L21/00 ; H01L21/84 ; H01L29/04 ; H01L29/10 ; H01L27/14 ; H01L31/036 ; H01L23/48 ; C23C14/14 ; C23C14/34 ; H01L23/52 ; H01L29/786
Abstract:
A method for forming a thin film according to an exemplary embodiment of the present invention includes forming the thin film at a power density in the range of approximately 1.5 to approximately 3 W/cm2 and at a pressure of an inert gas that is in the range of approximately 0.2 to approximately 0.3 Pa. This process results in an amorphous metal thin film barrier layer that prevents undesired diffusion from adjacent layers, even when this barrier layer is thinner than many conventional barrier layers.
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