Invention Grant
- Patent Title: Splitting method for optical device wafer
- Patent Title (中): 光学器件晶片的分割方法
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Application No.: US13465186Application Date: 2012-05-07
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Publication No.: US08946056B2Publication Date: 2015-02-03
- Inventor: Hiroumi Ueno , Hitoshi Hoshino
- Applicant: Hiroumi Ueno , Hitoshi Hoshino
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2011-107206 20110512
- Main IPC: H01L21/78
- IPC: H01L21/78 ; B23K26/38 ; B23K26/08 ; B23K26/40 ; H01L33/00

Abstract:
In a splitting method for an optical device wafer, the wafer having optical devices formed individually in regions partitioned by a plurality of crossing scheduled splitting lines provided on a front surface and having a reflective film formed on a reverse surface, a focal point of a laser beam is positioned to the inside of the optical device wafer and the laser beam is irradiated along the scheduled splitting lines from the reverse surface side of the wafer to form modification layers in the inside of the wafer. An external force is applied to the wafer to split the wafer along the scheduled splitting lines and form a plurality of optical device chips. The laser beam has a wavelength that produces transmittance through the reflective film equal to or higher than 80%.
Public/Granted literature
- US20120289026A1 SPLITTING METHOD FOR OPTICAL DEVICE WAFER Public/Granted day:2012-11-15
Information query
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