Invention Grant
US08946096B2 Group IV-B organometallic compound, and method for preparing same
有权
IV-B族有机金属化合物及其制备方法
- Patent Title: Group IV-B organometallic compound, and method for preparing same
- Patent Title (中): IV-B族有机金属化合物及其制备方法
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Application No.: US14001957Application Date: 2012-03-02
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Publication No.: US08946096B2Publication Date: 2015-02-03
- Inventor: Dae-jun Ahn , Hyun-chang Kim
- Applicant: Dae-jun Ahn , Hyun-chang Kim
- Applicant Address: KR Gyeonggi-Do
- Assignee: Mecharonics Co. Ltd.
- Current Assignee: Mecharonics Co. Ltd.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Jacobson Holman, PLLC.
- Priority: KR10-2011-0022615 20110315; KR10-2012-0012738 20120208
- International Application: PCT/KR2012/001566 WO 20120302
- International Announcement: WO2012/124913 WO 20120920
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/18 ; C23C16/40 ; C07F17/00
Abstract:
The present invention relates to novel 4B group metalorganic compounds represented by following formula I and the preparation thereof. Specifically, the present invention relates to a thermally and chemically stable 4B group organo-metallic compound utilized in chemical vapor deposition (CVD) or atomic layer deposition (ALD), and the preparation thereof. A 4B group metalorganic compound prepared according to the present invention volatiles easily and is stable at high temperature, and can be used effectively in manufacturing 4B group metal oxide thin films. wherein M represents Ti, Zr or Hf, R1 represents C1˜C4 alkyl, R2 and R3 represent independently C1˜C6 alkyl.
Public/Granted literature
- US20130337659A1 NOVEL GROUP IV-B ORGANOMETALLIC COMPOUND, AND METHOD FOR PREPARING SAME Public/Granted day:2013-12-19
Information query
IPC分类:
