Invention Grant
US08946295B2 Histone hyperacetylating agents for promoting wound healing and preventing scar formation
有权
用于促进伤口愈合和预防瘢痕形成的组蛋白超乙酰化剂
- Patent Title: Histone hyperacetylating agents for promoting wound healing and preventing scar formation
- Patent Title (中): 用于促进伤口愈合和预防瘢痕形成的组蛋白超乙酰化剂
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Application No.: US10843025Application Date: 2004-05-10
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Publication No.: US08946295B2Publication Date: 2015-02-03
- Inventor: Yih-Lin Chung
- Applicant: Yih-Lin Chung
- Applicant Address: TW New Taipei
- Assignee: Sunny Pharmtech Inc.
- Current Assignee: Sunny Pharmtech Inc.
- Current Assignee Address: TW New Taipei
- Agency: Cesari and McKenna, LLP
- Main IPC: A61K31/192
- IPC: A61K31/192 ; A61K31/19 ; A61K31/351 ; A61K31/166 ; A61K38/12

Abstract:
A method for promoting wound healing and preventing scar formation in a variety of wounds in skin, mucosa, and cornea. The method comprises administering a therapeutically effective amount of a histone deacetylase inhibitor or a hyperacetylating agent. The histone deacetylase inhibitor or hyperacetylating agent is capable of stimulating multiple cytokines/growth factors in the early phase of wound healing, and suppressing fibrogenic cytokines/growth factors in the late phase of tissue remodeling in the wound site, and is useful in promoting epithelial cell re-growth and reducing excessive collagen accumulation, which results in rapid wound closure with reduced scaring.
Public/Granted literature
- US20070072793A1 Histone hyperacetylating agents for promoting wound healing and preventing scar formation Public/Granted day:2007-03-29
Information query
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