Invention Grant
- Patent Title: Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof
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Application No.: US13742465Application Date: 2013-01-16
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Publication No.: US08946371B2Publication Date: 2015-02-03
- Inventor: Phillip J. Brock , Blake W. Davis , Qinghuang Lin , Robert D. Miller , Alshakim Nelson , Jitendra S. Rathore , Ratnam Sooriyakumaran
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Main IPC: C08G77/14
- IPC: C08G77/14 ; H01L23/532 ; C07F7/21 ; C08L83/14 ; G03F7/075 ; G03F7/40 ; H01L21/02 ; H01L21/31 ; H01L21/768 ; C08G77/50 ; G03F7/004
Abstract:
Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
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