Invention Grant
- Patent Title: Highly soluble salt of pyrroloquinoline quinone and method for producing the same
- Patent Title (中): 吡咯并喹啉醌的高溶性盐及其制备方法
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Application No.: US13989974Application Date: 2011-11-25
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Publication No.: US08946423B2Publication Date: 2015-02-03
- Inventor: Kazuto Ikemoto
- Applicant: Kazuto Ikemoto
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-263548 20101126
- International Application: PCT/JP2011/077213 WO 20111125
- International Announcement: WO2012/070649 WO 20120531
- Main IPC: C07D471/04
- IPC: C07D471/04 ; A61K31/475
Abstract:
An object of the present invention is to provide a salt of pyrroloquinoline quinone having a high solubility in water and in an organic solvent and a method for producing the same. According to the present invention, there are provided an ammonium salt of pyrroloquinoline quinone having a high solubility in water and in an organic solvent, consisting of a pyrroloquinoline quinone ion and an ammonium salt having a hydroxyl group.
Public/Granted literature
- US20130253001A1 HIGHLY SOLUBLE SALT OF PYRROLOQUINOLINE QUINONE AND METHOD FOR PRODUCING THE SAME Public/Granted day:2013-09-26
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