Invention Grant
- Patent Title: Laser patterning process
- Patent Title (中): 激光图案化工艺
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Application No.: US12688327Application Date: 2010-01-15
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Publication No.: US08946593B2Publication Date: 2015-02-03
- Inventor: Jae-Ho Lee , Tae-Min Kang , Seong-Taek Lee
- Applicant: Jae-Ho Lee , Tae-Min Kang , Seong-Taek Lee
- Applicant Address: KR Giheung-Gu, Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Giheung-Gu, Yongin, Gyeonggi-Do
- Agent Robert E. Bushnell, Esq.
- Priority: KR2004-0101424 20041203
- Main IPC: B23K26/06
- IPC: B23K26/06 ; C09K19/00 ; H01L51/00 ; B23K26/073 ; H01L51/50

Abstract:
In a laser irradiation device, a patterning method and a method of fabricating an Organic Light Emitting Display (OLED) using the same. The laser irradiation device includes a light source, a mask, a projection lens, and a Fresnel lens formed at a predetermined portion of the mask to change an optical path. When an organic layer pattern is formed using the laser irradiation device, laser radiation is irradiated onto a region of an organic layer, which is to be cut, and the laser radiation is appropriately irradiated onto a region of the organic layer, which is to be separated from a donor substrate. The laser radiation irradiated onto an edge of the organic layer pattern has a laser energy density greater than that of the laser radiation irradiated onto other portions of the organic layer pattern. As a result, it is possible to form a uniform organic layer pattern and reduce damage of the organic layer.
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