Invention Grant
- Patent Title: Semiconductor devices and methods of fabricating the same
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US13938833Application Date: 2013-07-10
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Publication No.: US08946665B2Publication Date: 2015-02-03
- Inventor: Sunil Shim , Wonseok Cho , Woonkyung Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2012-0075595 20120711
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L21/28 ; H01L29/792 ; H01L21/8239 ; H01L27/11 ; H01L27/115 ; H01L23/538 ; H01L27/24 ; H01L45/00

Abstract:
A semiconductor device includes a plurality of first insulating layers and a plurality of second layers alternately and vertically stacked on a substrate. Each of the plurality of second layers includes a horizontal electrode horizontally separated by a second insulating layer. A contact plug penetrates the plurality of first insulating layers and the second insulating layer of the plurality of second layers.
Public/Granted literature
- US20140014889A1 SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME Public/Granted day:2014-01-16
Information query
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